Pure HCl Gas Production
PURE HCL GAS PRODUCTION BY SYNTHESIS UNIT AND STRIPPING WITH MOLECULAR SIEVE
Pure HCI gas is typically used for high purity silicon applications like solar cell or electronics. It is also used in organic chemistry and various metallurgical processes.
There are two ways to produce pure HCl; by synthesis unit or by stripping. The method chosen depends on the gas pressure, nature and quality of the fed stream.
Mersen's anticorrosive equipment for HCl gas production include:
- Production of pure HCl gas at 2 barG by Synthesis Unit or at 5 barG by stripping unit
- Process equipment manufactured in corrosion-resistant material such as Graphilor®3, Tantalum CL-Clad® or Armylor®
- Armylor® piping
- Instrumentation
- Engineering documentation
- Optional skid-package
CUSTOMER BENEFITS:
- Proven solution
- Experienced partner
- Reliable and corrosion-resistant equipment
- Customized solutions
MATERIAL EXPERTISE:
- Graphilor® 3, the only impregnated graphite that is a combination of ultra-fine, grain isostatic graphite and specific resins.
- CL-Clad®, a brazing process developed by Mersen.
- Armylor® PTFE, a Mersen produced material made from PTFE or PFA.
